SACHEM Attending SPIE Advanced Lithography Conference

SPIE logoFebruary 23-27th  SACHEM Associates are in attendance for the 2014 SPIE Advanced Lithography Conference in San Jose, California.  For 38 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

SACHEM is a leading supplier of electronic formulation components used in developer applications for electronic applications  and has been for over 20 years. Most developer applications have been solved using Tetramethylammonium Hydroxide (TMAH) and Tetrabutylammonium Hydroxide (TBAH). SACHEM has available Envure DV™ to help meet the growing performance, safety and quality standards in the electronics industry.  Envure DV™ is designed specifically for photoresist developer and lithography applications.