Tetramethylammonium Hydroxide (TMAH) manufactured by SACHEM is of the highest quality available worldwide. TMAH is a quaternary ammonium compound (Quat) that is used in the manufacturing of integrated circuits, flat panel displays, printed circuit boards, capacitors, sensors, and many other electronic components. The molecular formula is N(CH₃)₄⁺ OH⁻ and it is commonly manufactured as an aqueous solution, in methanol or in propelyne glycol. SACHEM is one of the oldest tetramethylammonium hydroxide suppliers in the world.
Tetramethylammonium Hydroxide Benefits:
We have manufacturing facilities in America and Asia and can ship our products anywhere in the world.
- Contains no metal
- Leaves no residual on heating
- Features exceptionally low contaminant levels
- Various grades specific to each application
- Customize specifications to meet unique requirements of the individual customer
- Exceptionally consistent product quality
- Reliability for your high volume production
- Advanced Ceramics
- Trans-esterification catalyst
- Photoresist developer
- Component for smooth silicon etching/lithography
- Strong Base
- Wafer cleaning component
- Chemical stripper in semiconductor manufacturing
- Structure directing agent for zeolite synthesis
Markets for TMAH:
- Printed Wiring Board
- Energy Storage
SACHEM is committed to the safe handling of all of our products. For more information on how to handle this product safely please visit our TMAH Safety Services page. You can also request a TMAH safety and handling presentation that includes information on toxicity, PPE suggestions and more.
Synonyms: Ammonium Tetramethyl Hydroxide, TMAOH, TMAH, TMH,
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SACHEM has developed a closed loop recovery and recycling system for TMAH. It helps in the safe handling of TMAH by limiting exposure.
One of the industrial uses of TMAH is for the anisotropic etching of silicon. It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
TMAH belongs to the family of quaternary ammonium hydroxide (QAH) solutions and is commonly used to anisotropically etch silicon. Typical etching temperatures are between 70 and 90 °C and typical concentrations are 5–25 wt% TMAH in water. (100) silicon etch rates generally increase with temperature and increasing TMAH concentration. Etched silicon (100) surface roughness decreases with increasing TMAH concentration, and smooth surfaces can be obtained with 20% TMAH solutions. Etch rates are typically in the 0.1–1 micrometer per minute range.*
- TMAH undergoes simple acid-base reactions with strong or weak acids to produce tetramethylammonium salts whose anion is derived from the acid. Illustrative is preparation of tetramethylammonium fluoride:
- NMe4+ OH− + HF → NMe4+F− + H2O
- Solutions of TMAH may be used to make other tetramethylammonium salts in a metathesis reaction with ammonium salts, whereby the anion is derived from the ammonium salt. The reaction is driven in the desired direction by evaporative removal of ammonia and water. For example, tetramethylammonium thiocyanate may be made from ammonium thiocyanate, thus:
- NMe4+ OH− + NH4+SCN− → NMe4+SCN− + NH3 + H2O
- TMAH, in common with many other TMA salts containing simple anions, decomposes on heating into trimethylamine. Dimethyl ether is a major decomposition product rather than methanol. The idealized equation is:
- 2 NMe4+ OH− → 2 NMe3 + MeOMe + H2O