Tetramethylammonium Hydroxide (TMAH) manufactured by SACHEM is of the highest quality available worldwide. TMAH is a quaternary ammonium compound (Quat) that is used in the manufacturing of integrated circuits, flat panel displays, printed circuit boards, capacitors, sensors, and many other electronic components. The molecular formula is N(CH₃)₄⁺ OH⁻ and it is commonly manufactured as an aqueous solution, in methanol or in propelyne glycol. SACHEM is one of the oldest tetramethylammonium hydroxide suppliers in the world.
Tetramethylammonium Hydroxide Benefits:
We have manufacturing facilities in America and Asia and can ship our products anywhere in the world.
- Contains no metal
- Leaves no residual on heating
- Features exceptionally low contaminant levels
- Various grades specific to each application
- Customize specifications to meet unique requirements of the individual customer
- Exceptionally consistent product quality
- Reliability for your high volume production
- Advanced Ceramics
- Trans-esterification catalyst
- Photoresist developer
- Component for smooth silicon etching/lithography
- Strong Base
- Wafer cleaning component
- Chemical stripper in semiconductor manufacturing
- Structure directing agent for zeolite synthesis
Markets for TMAH:
- Printed Wiring Board
- Energy Storage
SACHEM is committed to the safe handling of all of our products. For more information on how to handle this product safely please visit our TMAH Safety Services page. You can also request a TMAH safety and handling presentation that includes information on toxicity, PPE suggestions and more. Use the buttons to the right to request a quote or get a sample one of our TMAH products.
Synonyms: Ammonium Tetramethyl Hydroxide, TMAOH, TMAH, TMH,
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SACHEM has developed a closed loop recovery and recycling system for TMAH. It helps in the safe handling of TMAH by limiting exposure.
One of the industrial uses of TMAH is for the anisotropic etching of silicon. It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.