Austin, TX – April 7, 2009 – SACHEM has published an article titled, “Use of TMAH in Dry Film Resist Formulations” on its website.  The white paper outlines information on using Tetramethylammonium Hydroxide and Choline in resist formulations.

The study was performed by Alfred P. Orio, President and Director of Process Analytical Services, Inc.  The study notes that TMAH provides speed, bath performance and yield.  .

“Using a TMAH/Choline blend yields far better results than standard chemistries allow”, John Puryear, Electronic Chemicals Business Director, stated.  “This is an interesting study that compares seven different bath make-ups to fully optimize your formulas.”