SACHEM, Inc. has announced today that it will take part in the SCUGM Seminar, presenting a technical paper highlighting the advances made in FEOL selective ethcing and cleaning.\u00a0 The paper will be delivered by SACHEM’s Applications Developement Manager, Russell Stevens<\/p>\n
Austin, TX -September 12th<\/sup>, 2007 –<\/strong>\u00a0SACHEM, Inc.\u00a0has announced today that it will be delivering a technical paper at The 6th<\/sup>\u00a0International SCUGM seminar. The seminar will take place September 19th<\/sup>, 2007 in Seoul, Korea at the COEX Conference Center and will focus on the advancements being made to make the wafer manufacturing process cleaner and more efficient.\u00a0 SACHEM will highlight its Front End of Line (FEOL) wet etch and selective cleaning technology in a paper delivered by Applications Development Manager, Russell Stevens.<\/p>\n SACHEM’s paper will focus on developments it has made in Front End-Of-Line (FEOL) wet etch selectivity and wafer cleaning applications.\u00a0 The company has recognized the challenges that traditional oxide etches have presented in the past and has created a solution based on precision and purity.\u00a0\u00a0 In order for the company to meet demands for shorter cycle time, increased uniformity and defect reduction, it has focused on the integration of its chemistries with single wafer tool technology.\u00a0 By using single wafer tool technology and by implementing its precision chemistry, focused on high selectivity, SACHEM can offer customers and development partners a product that will provide them \u00a0with an overall increased process performance.<\/p>\n SACHEM will also introduce\u00a0SelectEtchTM<\/sup>\u00a0SE-1220, an advanced contact cleaner.\u00a0 SelectEtchTM<\/sup>\u00a0SE-1220 represents a significant improvement in high-aspect-ratio contact clean performance. It successfully removes etch-generated residues from the bottom and sides of advanced contact features, achieving 1:1 selectivity between thermal oxides and lower density oxides such as BPSG and SOD. SE-1220’s chemical design and functionality allow it to remove residues while achieving outstanding surface roughness and maintaining critical dimensions, especially in complex film stacks.<\/p>\n Mark Stasney, Electronic Materials Marketing Manager of SACHEM, Inc., commented, \u00a0“SACHEM’S focus is on delivering products to our customers that will create opportunities that standard FEOL chemistries are not capable of.\u00a0 The way we found to do that was to create a product that delivers outstanding selectivity and clean performance in FEOL applications. We are excited to offer process engineers our SelectEtchTM<\/sup>\u00a0products which provide the highest in selectivity performance as compared with standard FEOL chemistries.”<\/p>\n","protected":false},"excerpt":{"rendered":" SACHEM, Inc. has announced today that it will take part in the SCUGM Seminar, presenting a technical paper highlighting the advances made in FEOL selective ethcing and cleaning.\u00a0 The paper will be delivered by SACHEM’s Applications Developement Manager, Russell Stevens Austin, TX -September 12th, 2007 –\u00a0SACHEM, Inc.\u00a0has announced today that it will be delivering a …<\/p>\n","protected":false},"author":43,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"wds_primary_category":0,"footnotes":""},"categories":[9,1],"tags":[],"class_list":["post-6058","post","type-post","status-publish","format-standard","hentry","category-news","category-uncategorized","no-thumb"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/posts\/6058","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/users\/43"}],"replies":[{"embeddable":true,"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/comments?post=6058"}],"version-history":[{"count":0,"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/posts\/6058\/revisions"}],"wp:attachment":[{"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/media?parent=6058"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/categories?post=6058"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.sacheminc.com\/ko\/wp-json\/wp\/v2\/tags?post=6058"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}