SACHEM's organic strong bases in methanol containing low metal-contamination  and are ideal for formulations in photolithography, cleaning, planarization, etching, as well as base-catalyzed synthetic reactions.

SACHEM is pleased to announce a developmental line of low metal-containing organic strong bases in methanol.  The lack of water and low metal contamination makes them an ideal component for formulations in photolithography, cleaning, planarization, etching, as well as base-catalyzed synthetic reactions. This class of quaternary hydroxides also provides the following benefits:

• Low corrosivity
• Increased solubility of organic residues
• Low metals
• Low viscosity

Contact us to discuss alternative solvents that would be desirable to your specific formulation needs.

The Envure™ Line of High Purity Non-Aqueous Organic Bases

SACHEM also has commercially available a line of non-aqueous organic hydroxides.  This expansion to the Envure™ product line includes strong bases in propylene glycol.  The organic solvent (propylene glycol) has been carefully selected for its low vapor pressure which minimizes emissions and concentration changes due to evaporation.  Low contaminant levels make these compounds the ideal choice for extremely demanding applications requiring high purity and precision manufacturing.