SelectEtch™ Selective Front End of Line (FEOL) Metal Etchants

SACHEM SelectEtch SE-1300™ series selectively etch new materials such as Ruthenium. Our SE-1300 series products are effective alternatives to standard etchants, such as CAN.  Our products offer outstanding selectivity and purity.

Ruthenium Etch
SelectEtch™ SE-1310 Ruthenium Wet Etchant

  • Fast Ruthenium etch rate
  • Selective to High-k and RuOxide
  • Dilute aqueous solution
  • Low surface contamination 

 Industry standard is Cerric Ammonium Nitrate (CAN) which causes high metallic contamination.  SelectEtch SE-1310 is designed for selective removal of Ruthenium metal, especially in FEOL metal gate applications and BEOL Cu barrier layer applications.
ru vs. temp

SelectEtch™ SE-1310 is designed for selective removal of Ruthenium metal, especially in FEOL metal gate applications and BEOL Cu barrier layer applications.

HfSiON Thickness Change @45 C

     Product

     5 min

    15 min

     30 min

     SE1310

     -0.77

     +0.55

     -3.20

*- indicates loss +indicates gain

 

 


Available Products

SelectEtch™ SE-1300 Selective TiN Metal Etchant

Etchant for TiN selective to thermal oxide.

Resources Coming Soon.

SelectEtch™ SE-1310 Ru Selective Etchant

Etchant for Ruthenium selective to HfSiON and RuOx.