Tetramethylammonium Hydroxide 7% Propylene Glycol solution (TMAH/PG) is commonly used as a stripper when manufacturing integrated circuits.  This specially formulated product represents the potential for improved performance and economics for customers who desire a safe-to-use, anhydrous source of non-metallic hydroxide for their integrated circuit applications. 

Our line of Envure^TM  strong organic bases in solvent are ideal in a number of electronic cleaning applications which include edge bead removers or high dose implant photoresist strippers.  Depending on the functionality requirement of your formulation, choose from the organic cation products below:

Tetramethylammonium Hydroxide (TMAH), 24.9% 

Tetrabutylammonium Hydroxide (TBAH), 25%

Benzyltrimethylammonium Hydroxide (BzTMAH), 25%