METAL ION FREE (MIF) DEVELOPER

SACHEM offers various grades of TMAH for Metal Ion Free (MIF) developer applications. more

FRONT END OF LINE (FEOL) CHEMISTRY

Advanced technology nodes are posing critical challenges to Front End wet cleaning and surface preparation engineers. more

INTEGRATED CIRCUIT (IC) STRIPPER

Tetramethylammonium Hydroxide 7% Propylene Glycol solution (TMAH/PG) is commonly used as a stripper when manufacturing integrated circuits. more

CHEMICAL MECHANICAL PLANARIZATION (CMP)

Chemical Mechanical Planarization or Polishing (CMP) requires high purity and precise chemistry before additional processing can occur. more
INTEGRATED CIRCUIT CHEMICALS
Reduced feature sizes, new materials and constant process innovation are continuing challenges for the Integrated Circuit manufacturing market. 

SACHEM helps you meet these challenges with high purity chemicals specialized for making Metal Ion Free (MIF) Developer, FEOL Chemistry, Integrated Circuit (IC) Strippers and chemistry for Chemical Mechanical Planarization (CMP) applications. 

Our emphasis on purity, precision and chemical expertise has been fundamental to our 40 year history of providing innovative products and services to the Integrated Circuit market.