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ORGANIC STRONG BASES - Envure™
SACHEM’s Organic Strong Base products form the foundation of many critical formulations in lithography, cleaning, planarizing and etching applications.  We employ advanced Envure™ technology to deliver the highest purity and consistency available in the world.

Envure™ Organic Strong Bases offer:
  • Organic solubility
  • Low contaminant levels
  • Strong bases content without metal cations
  • Availability in both aqueous and non-aqueous media

The Envure™ Line of High Purity Non-Aqueous Organic Bases

SACHEM also has commercially available a line of non-aqueous organic hydroxides.  This expansion to the Envure™ product line includes strong bases in propylene glycol.  The organic solvent (propylene glycol) has been carefully selected for its low vapor pressure which minimizes emissions and concentration changes due to evaporation.  Low contaminant levels make these compounds the ideal choice for extremely demanding applications requiring high purity and precision manufacturing.

Available Products

Benzyltrimethylammonium Hydroxide

20%, Aqueous, Envure™ (Envure™-813)
M/SDS  |  Datasheet [42 KB]  

Benzyltrimethylammonium Hydroxide

10%, Propylene Glycol Solution (Envure™ 814)
M/SDS  |  Datasheet [41 KB]  

Tetrabutylammonium Hydroxide

55%, Aqueous, Envure™ (Envure™-855)
M/SDS  |  Datasheet [38 KB]  

Tetrabutylammonium Hydroxide

10%, Propylene Glycol Solution (Envure™ 857)
M/SDS  |  Datasheet [40 KB]  

Tetraethylammonium Hydroxide

20%, Aqueous, Envure™ (Envure™-643)
M/SDS  |  Datasheet [39 KB]  

Tetraethylammonium Hydroxide

10%, Propylene Glycol Solution (Envure™ 838)
M/SDS  |  Datasheet [40 KB]  

Tetrapropylammonium Hydroxide

40%, Aqueous, Envure™ (Envure™-846)
M/SDS  |  Datasheet [35 KB]  

Tetrapropylammonium Hydroxide

10%, Propylene Glycol Solution (Envure™ 847)
M/SDS  |  Datasheet [40 KB]