INDUSTRIES

SelectEtch™ Selective Front End of Line (FEOL) Oxide Etchants

SACHEM SelectEtch™SE-1100 series is the key for fast removal of thermal and doped oxides, consistent wet oxide etch rates with time to avoid over-etch, minimal attach on SiN and TiN films and good compatibility with polysilicon.

SelectEtch™ Front End of Line (FEOL) Advanced Contact Cleaners

SACHEM SelectEtch™ SE-1200 Series has cleaner contacts with minimal critical dimension variation, higher or equivalent activity on thermal oxides vs. doped or low density oxides, and more precise control through lower overall etch rates.

SelectEtch™Selective Front End of Line (FEOL) Silicon Etchants

SACHEM SelectEtch 1400™ series delivers selective etching across crystal planes, minimized surface roughness, and controllable etch rates.

FRONT END OF LINE (FEOL) CHEMISTRY

Front End of Line (FEOL) Experts with selective. intelligent. chemistry.

Advanced technology nodes are posing critical challenges to Front End wet cleaning and surface preparation engineers, including:

Reduced silicon and oxide loss budgets (<1 A per cleaning step)
New materials of construction for features and contacts
Increasing concern over cleaning effects on plasma-damaged films

SACHEM has the critical technology base and competancies to address the challenges posed by the "wave" of new materials and device complexity in FEOL applications. Our solutions approach is integrated with the specific capabilities of advanced Front End wet clean and surface preparation tools.

PRODUCT CATEGORIES

Oxide Etchants
Advanced Contact Cleaners
Silicon Etchants