INDUSTRIES

SelectEtch™ SELECTIVE OXIDE ETCHANTS

SACHEM provides specialty wet oxide etchants for Front End of Line applications requiring new levels of selectivity and precision.

SelectEtch™ ADVANCED CONTACT CLEANERS

We thrive on challenges with high aspect ratio contacts and complex film stacks. Let our SelectEtch™ products deliver more process latitude and consistent results.

SelectEtch™ SELECTIVE METAL & SILICON ETCHANTS

SACHEM's has created a line of specialty etchants for FEOL applications where selectivity performance, precision and purity combine as exacting requirements. We provide solutions for selective etching challenges driven by new processes and materials in Front End device manufacturing.

Applications include

New gate metals
New high-k oxide compatibility requirements
Removal of unreacted metals in advanced Silicide applications
Planar-selective etching of silicon to create precise source-drain recess geometries in P-MOS strain applications

We can solve your challenging selective metal and silicon etch challenges with innovative products.

FRONT END OF LINE (FEOL) CHEMISTRY

Front End of Line (FEOL) Experts with selective. intelligent. chemistry.

Advanced technology nodes are posing critical challenges to Front End wet cleaning and surface preparation engineers, including:

Reduced silicon and oxide loss budgets (<1 A per cleaning step)
New materials of construction for features and contacts
Increasing concern over cleaning effects on plasma-damaged films

SACHEM has the critical technology base and competancies to address the challenges posed by the "wave" of new materials and device complexity in FEOL applications. Our solutions approach is integrated with the specific capabilities of advanced Front End wet clean and surface preparation tools.

PRODUCT CATEGORIES

Oxide Etchants
Advanced Contact Cleaners
Silicon Etchants