Are standard chemistries such as dilute Hydrofluoric Acid (dHF) and Buffered Oxide Etch (BOE) going to meet your FEOL surface preparation needs for advanced devices?

We don't think so.

New materials and devices are completely overwhelming the capability of standard chemistries.  dHF and BOE methods can't take advantage of single wafer processing technology.

Let Us Prove It To You:  

• Our specialty raw material synthesis is unique and can solve complex FEOL Surface Preparation problems
• We can manufacture and deliver integrated solutions with the Purity and Precision required in the FEOL
• We have a solid understanding of the relationship between performance and the chemical science behind the components

SACHEM is your leading provider of Chemical Solutions for Front End Of Line Single Wafer Cleaning and Surface Preparation Applications.