Planar-Selective Silicon Etchant allows device manufacturers to create more precise structures in crystalline silicon through enhanced silicon recess feature formation and improved surface roughness characteristics.
SOCMA's annual Performance Improvement Awards Program was recently held in New York City to honor outstanding companies based on their individual achievement in environmental, health, safety, and security.
SACHEM, Inc. is pleased to announce the start-up of its newest facility in Wuxi, Jiangsu, P.R.C. The site occupies approximately 80,000 sq. meters in the Wuxi New District (WND) development zone.